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Literature / Source Database:
Plasma Chemistry and Plasma Processing
| Title (short) |
Plasma Chem. Plasma Processing |
| Languages |
English |
| Impact factor |
1.811 |
| Editor |
Steven Girshick |
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Status
active
Subject
Source type
Journal
Publisher
ISBN ISSN
0272-4324
E ISSN
1572-8986
First volume
1
Last volume
28+
Homepage
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Availability |
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| Text PDF |
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free access |
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| Text Html |
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for subscriber |
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| References |
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not available |
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| Abstracts |
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| TOC |
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Description
Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Papers are particularly encouraged that report studies of chemical kinetics in plasmas, or the interactions of plasmas with surfaces.
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