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Material Database:
SRM 2134 - Arsenic in Silicon
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| Type |
Certified reference material |
| Producer |
National Institute of Standards and Technology (NIST)
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| Status |
Available |
| Material |
Solid |
| Reference |
SRM 2134 |
| Catalog (Web) |
https://www-s.nist.gov/srmors/view_detail.cfm?srm=2134 |
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Description
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Arsenic in Silicon Arsenic Implant in Silicon Profile Standard Value 75As: 0.09120 µg/cm2
(7.330 x 1014 atoms/cm2) Unit/Size
(cm) 1 cm x 1 cm crystal
Production and Physical Description: The starting material consisted of a commercial 200 mm p-type silicon (100) single crystal wafer polished on one side. The polished side of the silicon wafer was implanted with 75As ions at a nominal energy of 100 keV in an ion implanter. The wafer was nominally at room temperature during the implantation. The wafer was cut into 1 cm x 1 cm squares with a wafer saw. All squares were located at least 1 cm from the edge of the wafer. keywords: industrial material , semiconductor
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Package |
Unit/Size
(cm)1 cm x 1 cm crystal |
Parameter
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| Analyte | Arsenic | | Specification | Arsenic Implant in Silicon Depth Profile Standard (75As) | | Parameter | Certified value | | Unit | µg / cm2 | | Result | 0.09120 +/- 0.00035 | |
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