The sophisticated 6" super eucentric stage of the SUPRA™ 60 combined with the 8" integrated airlock offers the perfect solution for full wafers and cross sectional semiconductor applications. The SUPRA™ 60 with the new improved GEMINI® column and its excellent low voltage capabilities is the instrument of choice when examining delicate specimens and uncoated wafers. The refined stage control for the SUPRA™ 60 includes magnification compensated stage movements for ease of use. The variable eucentric working distance means that both large and small samples can be tilted with minimal image shift giving quicker results with less adjustments.
Ultra high resolution over the complete voltage range: 1.0 nm @ 15 kV, 1. 7nm @ 1 kV
6-axes motorised super eucentric specimen stage with ultra fine stage control
High efficiency In-lens detector for clear surface specific SE imaging
Short analytical working distance of 8.5 mm for simultaneous high resolution imaging and X-ray analysis
Large sample throughput with integrated 8'' airlock
Easy operation through Windows® XP based SmartSEM™ control software