EMAS 2005

The workshop is being organised in collaboration with SISM – Societá Italiana di Scienze Microscopiche. The well established, successful EMAS format consists of a limited number of invited tutorial lectures, and round-table discussions on the same topics led by experts in the field.All other contributions will be hosted in the form of poster presentations.The format is aimed at maximising transfer of knowledge among the participants and at providing a comprehensive exhibition of the latest analytical equipment.The programme allows for adequate time and opportunities for participants to visit the technical exhibitions and hold discussions with the manufacturers.

Scientific programme 
Eight sessions, each encompassing two or more invited lectures, will highlight the main topics dealt with during this workshop: 

• Electron probe microanalysis
• Monte Carlo simulation in EPMA.  Comparison of different Monte Carlo simulation algorithms (F. Salvat, Universitat de Barcelona, Spain);
• Quantitative X-ray microanalysis of heterogeneous materials using Monte Carlo simulations (R. Gauvin, McGill University, Montréal, Canada);
• Quantitative bulk and trace element X-ray mapping using multiple detectors (K. Moran, Moran Scientific Pty Ltd., Goulburn, Australia);
• LEXES as applied to semiconductors (P.-F. Staub, Cameca SA, Courbevoie, France);
• Determination of the efficiency of energy-dispersive X-ray spectrometers by a new reference material (M. Procop et al., Bundesanstalt für Materialforschung und -prüfung, Berlin, Germany).
• Cathodoluminescence
• Combined CL and X-ray data processing options and strategies (S. Galloway, Gatan Ltd., Corby, Great Britain);
• Time-resolved spectral CL imaging and analysis (M.R. Phillips, University of Technology Sydney, Broadwa, Australia).
• Analysis and characterisation of nanostructures
• Microanalysis with XPEEM, LEEM and LEED (E. Bauer, Arizona State University, Tempe, U.S.A.);
• 3DAP characterisation of metallic nanostructures (K. Hono, National Institute for Materials Science, Tsukuba, Japan).
• Particle beam techniques
• Semi-quantitative analysis of microstructures by secondary ion mass spectrometry (D. Phinney, Lawrence Livermore National Laboratory, Livermore, U.S.A.);
• Particle-induced X-ray emission with microbeams: main features and applications (P.A. Mandò, Università di Firenze, Italy).
• Electron backscatter diffraction (EBSD)
• Advances in orientation imaging in the TEM and applications to nanostructures D.J. Dingley, Edax Inc., Draper, U.S.A.);
• Advances in electron backscatter diffraction for the characterisation of interfaces (V. Randle, University of Wales, Swansea, Great Britain).
• Environmental microanalysis techniques (ESEM and VP-SEM)
• Low-vacuum microanalysis field-emission SEM (B.L. Thiel, University of Cambridge Great Britain);
• ESEM applications to cultural heritage conservation (E. Doehne, The Getty Conservation Institute, Los Angeles, U.S.A.).
• Atomic-scale analysis by TEM-STEM
• Exploring the limits of transistor scaling with electron microscopy (P. Voyles, University of Wisconsin, Madison, U.S.A.);
• Atomic level characterisation based on de-focus image modulation processing electron microscopy (Y. Takai, Osaka University, Japan).
• Applications to catalysts, composites, cultural heritage, forensics, glass, sensors, and in biology, geology, mineralogy, metallurgy, microelectronics, etc.