|
Instrument Database:
Kratos Analytical - Micro EDX
| |
|
|
| |
|
| |
|
| Year of introduction |
|
| Status |
available |
| Company |
Kratos Analytical
|
| Categories |
X-ray spectrometer: XRF
|
Microanalysis of electronic components, circuit boards, and foreign matter in foods was difficult with conventional fluorescence X-Ray spectrometers due to poor sensitivity at a small illuminated size and insufficient resolution even at full X-Ray intensity. However, the new Shimadzu series of Micro EDX spectrometers achieves high sensitivity and high resolution analysis of such samples down to a minimum measured diameter of 50 microns.
Conventional high speed, non dispersive micro X-Ray fluorescence spectrometers lacked the resolution to handle complex samples and struggled to analyze light elements. Similarly, the collimator type energy dispersive instruments lacked excitation intensity, resulting in problems of low throughput and the necessity for tedious measurements in vacuum.
Key micro EDX features
- Polycapillary X-Ray Lens High Sensitivity Micro Analysis (50µm)
- Analyze Light to Heavy Elements in Air
- Dual CCD Camera (High & Low Magnification) Simple positioning of the Sample
- Element Mapping Maps Multiple Elements Simultaneously
- 5 Primary Filters Provided as Standard Automatically Eliminates Undesirable X-Rays from the Tube & Improves Signal to Noise Ratio
- Transmission Imaging Unit (Optional) Simultaneous Measurement of Transmission X-Ray Images
- Accommodates Samples up to 200(W) x 300(D) x 40(H)mm
- Real Time Scaling Stage Viewer Function Displays Entire Stage Simple mouse click on analysis position moves the stage to target
Models availiable:
µEDX-1200
Al - U (WD = 6.5mm)
standard model
µEDX-1300
Na - U (WD = 1.5mm)
light elements
µEDX-1400
Al - U (WD = 6.5mm)
LN2 not required
|
| Specifications |
|
X-Ray generator
X-Ray tube RH target
voltage 5 -50kV
current 1 -1000µA
cooling air (fan forced)
X-ray convergence method polycapillaries
irradiated diameter 50µm (@8kV)
primary filter autochange of 5 (Al, Ti, Ni, Zr, out)
Detector (µEDX-1200 & µEDX-1300)
type Si (Li) semiconductor detector
LN2 supply during measurment only
Dewar capacity 3 L
LN2 consumption approx 1L / day
detection area 30 mm2
Detector (µEDX-1400)
type Si drift semiconductor detector
cooling method electronic
LN2 supply not required
detection area 5 mm2
Sample stage
maximum stroke 100(W)x100(D)x40(H) mm
maximum load 2 kg
working distance 6.5mm (µEDX-1200 & µEDX-1400)
1.5mm (µEDX-1300)
Data processing hardware
type PC
operating system Windows 2000
printer color printer
|
|
