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Instrument Database:
Physical Electronics - TRIFT IV TOF-SIMS
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| Year of introduction |
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| Status |
available |
| Company |
Physical Electronics
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| Categories |
Mass spectrometer: SIMS/SNMS
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The TRIFT IV™ Time-of-Flight Secondary Ion Mass Spectrometer (TOF-SIMS) provides sub-micron elemental, chemical and molecular characterization and imaging of solid surfaces and thin films for products such as semiconductors, hard disk drives, polymers, paint and other surface coatings. Manufacturing companies in the chemical, semiconductor and pharmaceutical industries can use the TRIFT IV to improve product performance, conduct failure analysis and manage process control.Time-of-Flight SIMS differs from Dynamic SIMS in that it can analyze the outermost one or two mono-layers of a sample while preserving molecular information. While D-SIMS provides primarily elemental information, TOF-SIMS analysis yields elemental and molecular data. It is ideal for organic or inorganic materials, and can be used to characterize both insulating and conductive samples.With detection limits in the ppm to ppb range, shallow depth profiling capabilities and automated analysis, the TRIFT IV can be used to analyze surface contamination, trace impurities, thin films and delamination failures. It is also a valuable tool to investigate surface modification chemistry and catalyst surface composition.
The PHI TRIFT IV is the next generation of PHI’s highly successful line of TOF-SIMS instruments which utilize the patented TRIFT analyzer.ك The TRIFT IV offers further improvements in performance and automation. The liquid metal ion gun can now be configured with a Au ion source, providing increased sensitivity for the detection of high mass molecular fragments. The TRIFT IV offers a new level of performance in both imaging spatial resolution and high mass resolution spectroscopy.
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