EVISA Contact EVISA | Sitemap | Home   
 Advanced search
The establishment of EVISA is funded by the EU through the Fifth Framework Programme (G7RT- CT- 2002- 05112).


Supporters of EVISA includes:

Glossary


triethylaluminium


Triethylaluminium (TEAl) can be used as a precursor for aluminum oxide deposition using the MOCVD process ( Metal Organic Chemical Vapor Deposition ) and in support of semi-conductor manufacturing.
Formula: (C2H5)3Al
CAS Number : 97-93-8
Other names: Aluminium triethyl; TEA


Back








Imprint     Disclaimer

© 2003 - 2024 by European Virtual Institute for Speciation Analysis ( EVISA )