EVISA - Who we are
The establishment of EVISA is funded by the EU through the Fifth Framework Programme (G7RT- CT- 2002- 05112).
Supporters of EVISA includes:
In semiconductor manufacturing, triethyl gallium (TEGa) is used in MOCVD to deposit GaAs or GaN layers.
Ga ; Gallium triethyl
CAS Number : 1115-99-7
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EWCPS 2023: European Winter Conference on Plasma Spectrochemistry
PittCon 2023: 73th Pittsburgh Conference on Analytical Chemistry and Applied Spectroscopy
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What's new on EVISA's web site ?
Online addition of an internal standard for high performance liquid chromatography-inductively coupled plasma mass spectrometry
Determination of Glyphosate in Rice with HPLC-ICP-MS/MS
Zero dead-volume interface for coupling µHPLC to ICP-MS
The Determination of Hexavalent Chromium in Airborne Particulate Matter in Presence of High Amounts of Trivalent Chromium
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