Instrument Database:
Analytik Jena GmbH - PlasmaQuant 9100 ICP-OES
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Year of introduction |
2020 |
Status |
available |
Company |
Analytik Jena GmbH
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Categories |
Spectrometer ( Atom. ): AES: ICP-AES |
Reveal the Details that Matter Maximum reliability – unique resolving power with high-resolution optics Convenient functionality – broad applicability and superior analytical performance Flexible observation – optimized plasma observation modes without compromises Increased productivity – Outstanding plasma robustness for analyzing any sample matrix
Add clarity, simplicity and confidence to your most delicate analytical routinesExperience superior analytical performance, application flexibility, robustness, and reliability with the optical emission spectrometer PlasmaQuant 9100. The high-resolution optics and exceptional matrix tolerance guarantee an efficient and uniquely sensitive analysis of geological samples, high-purity metals, chemical and petrochemical samples, as well as soils and industrial wastewater. In trace analysis of complex materials it is the sample that dictates your instrumental needs. High matrix contents require high plasma performance. Unique detection limits ask for a unique spectrometer design. The high-resolution ICP-OES technology makes unconditional confidence in your analytical results a reality. Results you can rely onThe feasibility of trace analytics in highly concentrated samples by ICP-OES strongly depends on the instrumental plasma performance towards rapidly varying sample types. Benefit from the widest working range as well as reduced sample preparation demands to improve precision, productivity and ease of use. - Cost-efficient shift-work operation
- Flexible plasma observation
- Interference-free emission lines
- System readiness within 15 minutes
The unique resolving power of the high-resolution optics guarantees unmatched sensitivity, accuracy and precision in real sample matrices. In combination with the flexible Dual View PLUS plasma observation system, you can determine both trace and macro-elements with a single measurement. The intelligent torch design, in combination with the high-frequency generator, ensures a stable plasma performance for any sample matrix as well as for rapidly changing sample loads.
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Specifications |
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General
- High-resolution ARRAY optical emission spectrometer with an inductively coupled plasma for multielement analyses of highest accuracy and precision
- Compact bench-top instrument designed for high performance analytical tasks and ease of use
- Wide range of accessories maximize productivity, safety, ease of use and reduce wear
RF Generator High Frequency RF Generator Type
| Free-running RF-tube generator
| Radio Frequency
| 40 MHz
| Power range | 700 to 1700 W (in 50 W increments) | Coil
| 4-winding copper | Power supply | Solid-state | Plasma warm-up time | < 5 min |
Plasma Observation Dual View Plus
Plasma observation
| Radial, axial
| Attenuated plasma observation | Radial plus, axial plus
| Control | Method parameter in software | Working range | Sub μg/L to high percentage range | Viewing position | Fully automated optimization of the plasma viewing position in all plasma observation modes | Removal of cold plasma tail
| Fully recycled counter gas argon |
Optical Bench High-resolution optics Type
| Echelle Double Monochromator | Pre-monochromator | Quartz prism | Entrance slit | 5 variable settings and fixed intermediate slit (dimensions entrance slit: 35 x 1800 μm) | Optical bench | Encapsulated and argon purged | Grating | Echelle grating with large blaze angle of 76° | Focal length | 400 mm | Spectral resolution | 0.006 nm at 200 nm | FWHM values | ≤ 5.0 pm for As 193.696, Tl 190.796 | Wavelength range | 160 – 900 nm | Number of accessible emission lines
| > 43,000 | Wavelength accuracy | < 0.4 pm via internal Ne-correction |
Detector Type
| Charge Coupled Device (CCD)
| Cooling
| Peltier cooled to -10 °C | Integration times | 1 ms to 10 s | Linear dynamic range | 6 orders of magnitude | Integration modes | Peak, spectrum |
Limits of Detection Element/Line [nm]
| LOD axial [μg/L] 0.5 % HNO3 | P 177.436 | < 2.0 | As 193.698 | < 2.0 | Zn 213.856 | < 0.1 | Pb 220.353 | < 1.0 | Mn 257.610 | < 0.05 | V 292.401 | < 0.1 | Cu 324.754 | < 0.2 | Na 589.592 | < 0.5 | K 766.491 | < 1.0 |
Gas Control Automated gasbox for all gas flows
| Yes | Plasma gas | 0 to 20 L/min with 0.1 L/min increments | Auxiliary gas | 0.2 to 2.0 L/min with 0.05 L/min increments
| Nebulizer gas | 0.1 to 1.5 L/min with 0.01 L/min increments | Oxygen gas | 0.0 to 0.05 L/min with 0.01 L/min increments | Gas purity | > 4.6 | Argon inlet pressure | 4 to 6 bar |
Self-Check System Sensors and interlocks - Gas pressures
- Gas flow rates
- Extraction rate of exhaust system
- Positioning of torch
- Pressure of spectrometer gas
- Nebulizer blockage
- Generator power
- Temperature of cooling agent
- Flow rate of cooling agent
- Plasma intensity and stability
- Status of door for torch compartment
Physical Data Weight
| Approx. 170 kg
| Dimensions (W x H x L) | 990 mm x 940 mm x 855 mm | Interface | PC connection: USB | Fuses | 32 A | Power supply | 230 V (± 10%) | Power consumption | 4600 VA | Operation conditions | + 15 to 35 °C, 20 to 90% relative humidity, non-condensing atmosphere, free from corrosive fumes | Exhaust requirements | 3.5 to 5.5 m3 / min | Technical Standards | Complies with standards for safety and electromagnetic compatibility for CE Marking (LVD 2014/35/EU; EMC 2014/30/EU; RoHS 2011/65/EU) and UL, CSA marking, ISO 9001 compliant | Gas consumption in standby | None | Warm-up from powered-down | < 15 min |
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