Agilent Technologies Inc. - 710 Series ICP-OES instruments
| Year of introduction
historical ( out of sale )
Agilent Technologies Inc.
Spectrometer ( Atom. ): AES: ICP-AES
The 710 Series ICP-OES instruments offers uncompromised performance for laboratories with low to moderate sample loads performing routine ICP-OES analyses. Easy-to-use, the 710 Series is also ideal for educational institutes and industries that need to comply with WEEE/RoHS directives.
- Continuous wavelength coverage provides extended dynamic range and reduced interferences, giving you maximum confidence in your results
- Robust plasma ensures reliable and reproducible results — even with the most complex matrices
- One view, one step measurement of major, minor, and trace elements, plus the fastest warm-up increases throughput and productivity
- Choice of optimized axial (710) or radial (715) configurations to suit your application needs
- Intuitive, powerful, and easy-to-use ICP-Expert II software
- Choice of optimized axial (710) or radial (715) configurations to suit your application needs.
- 715 includes an inert and robust, double-pass cyclone spraychamber and V-groove nebulizer as standard
- 710 includes a high sensitivity glass, single-pass cyclone spraychamber and Conikal nebulizer as standard
- Fully PC-controlled peristaltic pump, variable speed from 0–50 rpm, three channels for sample, drain and internal standard/ionization buffer
- Optional semi and fully-demountable torches with choice of glass or ceramic injector tubes, high solids torch and all-glass sample introduction system.
- Plasma and auxiliary gas flows are software controlled using switched flow controllers. The system is fully interlocked against gas failure.
- Nebulizer gas: software enabled with choice of flow control using a high precision pressure regulator, or computer controlled using mass flow control. MFC provides fl ow range 0–1.3 L/min in 0.01 L/min increments
- Plasma gas: 0–22.5 L/min in 1.5 L/min increments
- Auxiliary gas: 0–2.25 L/min in 0.75 L/min increments
- 40 MHz free-running, air-cooled RF generator. Power output of 700–1500 W in 50 W increments. Optimum power settings defined and stored within each method for different sample types
- Over 75% RF coupling efficiency
- Automatic ignition and shutdown with user-customizable ignition sequence
- Power output stability is better than 0.1%
- Radially viewed system (715 ICP-OES)
Vertically oriented, radially viewed plasma is ideal for the most difficult of applications, including the analysis of oils and organic solvents, geological/metal digests and high TDS solutions e.g., brines. Includes full PC control of plasma viewing height from 0-20 mm and horizontal adjustment of ±3 mm to optimize sensitivity and minimize interferences. Viewing height may be adjusted under PC control for each wavelength of interest.
- Axially viewed System (710 ICP-OES)
Horizontally oriented, axially viewed plasma is ideal for high sensitivity analyses. Provides a 2–8 fold improvement in detection limits compared to radial viewing. The axially viewed plasma system features a unique Cooled Cone Interface (CCI) to prevent the cooler plasma tail from being viewed by the optics. This reduces interferences, improves the system’s tolerance to high dissolved solids and extends the linear dynamic range compared to conventional axial systems. The CCI is a superior plasma interface with lower running costs compared to shear gas systems. Includes full X, Y adjustment of plasma viewing position under PC control.
- Computer-optimized echelle optical design with no moving optical parts ensures lowest detection limits and maximum stability
- 400 mm focal length polychromator is thermostatted to 35 °C for excellent stability. Features a precision prism cross disperser and echelle grating (94.74 lines/mm) creating an echellogram (of 70 orders) that is projected onto the megapixel CCD detector
- Standard polychromator purge of 0.75 L/min with PC controlled 3 L/min boost purge for operation with emission lines having wavelengths below 185 nm. Can be purged with either argon or nitrogen (requires optional nitrogen purge kit)
Megapixel CCD detector
- Innovative megapixel CCD detector features 1.12 million pixels, each 15 ìm x 15 ìm in an X-Y grid array for full wavelength coverage from 177 nm to 785 nm. The detector is thinned and back illuminated for enhanced Quantum Efficiency (QE) in the UV.
- The detector is mounted on a two stage Peltier device and cooled to -30 oC for low dark current and noise
- Auto Integration allows intense and trace signals to be measured simultaneously at the optimum signal-to-noise ratio, providing lowest possible detection limits and preventing over-range signals – more intense peaks are allocated shorter integration times and less intense peaks are allocated longer times
- The megapixel CCD detector features anti-blooming protection on each pixel. This enables the simultaneous measurement of trace level analytes in the presence of nearby intense signals.
Instrument software features
- ICP Expert II is an easy-to-use, web-integrated instrument software package. It features wizards that guide users through method and sequence development and method templates for rapid development of commonly used methods.
- Computer control of plasma gas flows, plasma viewing position, ignition, RF power, safety interlocks and utilities monitoring
- Choice of background correction techniques from traditional off-peak background correction to unique fitted background correction
- Fast Automated Curve-fitting Technique (FACT) for online spectral deconvolution of complex spectra
- MultiCal assists in extending linear dynamic range and automatic validation of results
- Number of replicates measured can be set by solution type (calibration standards, QC solutions, samples)
- Calibration routines for multi-element external calibration and method of standard addition
- Calibration reslopes eliminate the need for full re-calibration
- User-customizable Quality Control Protocols (QCP) designed to meet US EPA and other international compliance standards
- Fully editable sample label list with optional customer and batch label fi elds
- Weight/volume/dilution correction factors with user-defi nable concentration units conversion for samples and calibration/QC solutions
- Autosampler rack and tube positions can be edited for true random access sampling
- Sequence options include calibration/reslope/QCP error actions and end of analysis actions
- Calibrations can be programmed at a user-specifi ed rate either inline with sample tubes or from centralized calibration tubes (rate-driven)
- Microsoft’s SQL Server 2005 Express for secure storage and fast retrieval of results
- Real-time graphical display of signal spectra, results and calibration graphs
- Post-run retrospective data editing
- Wide variety of reporting and exporting options with userdefineable settings
- Graphical display of system status and comprehensive set of instrument diagnostic tools
- Comprehensive help system, including multimedia and video assistance
- Warm-up time from standby mode <10 mins from plasma ignition.
- Stray light elimination via baffl es and optical design to less than 2.0 mg/L effective As signal at 188.980 nm from 10 000 mg/L Ca.
- Signal stability: Typically stable to less than 1% RSD over 8 hours without internal standardization or any form of drift correction.
- Typical resolution (FWHM)
Element Wavelength (nm) Resolution (pm)
As 188.980 <9
Mo 202.032 <9
Zn 213.857 <10
Cr 267.716 <13
Cu 327.396 <19
Ba 614.172 <45